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Sillicon Nitride Protective Film by Reactive Ion Beam Sputtering.

SHINKU
doi 10.3131/jvsj.32.14
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Abstract

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Date

January 1, 1989

Authors
Daisuke INOUEShinichi TAKANOShuichi NOGAWAEisho OHSUGAEiji KAMIJO
Publisher

The Vacuum Society of Japan


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