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Comparison of EB Exposure Characteristics Between HSQ and Calix Arene of High Resolution Negative Resist
Journal of Photopolymer Science and Technology
- Japan
doi 10.2494/photopolymer.23.97
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Categories
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Date
January 1, 2010
Authors
S. Omoto
M. Okada
Y. Kang
K. Kanda
Y. Haruyama
S. Tono
S. Matsui
Publisher
Technical Association of Photopolymers, Japan