Comparison of Resist Family Outgassing Characterization Between EUV and EB

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.26.673
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Technical Association of Photopolymers, Japan

Related search

Comparison of EB Exposure Characteristics Between HSQ and Calix Arene of High Resolution Negative Resist

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2010English

The Performances and Challenges of Today’s EB Lithography and EB-resist Materials

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2014English

Advancements in EUV Resist Materials and Processing

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2009English

Evaluation of Resist Capability for EUV Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

Evaluation of EUV Resist Performance Using Interference Lithography

2015English

Metal Containing Resist Readiness for HVM EUV Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2016English

High-Sensitivity Molecular Organometallic Resist for EUV (MORE)

2015English

In Situ Analysis of the EUV Resist Pattern Formation During the Resist Dissolution Process

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2013English

Recent Progress in EUV Resist Outgas Research at EIDEC

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2015English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy