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Atomic Layer Deposition of High-K Dielectric Layers on Ge and III-V MOS Channels
doi 10.1149/1.2986824
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Date
January 1, 2008
Authors
Annelies Delabie
A. Alian
Florence Bellenger
Guy Brammertz
David P. Brunco
Matty Caymax
Thierry Conard
A. Franquet
Michel Houssa
Sonja Sioncke
S. Van Elshocht
J. L. Van Hemmen
W. Keuning
W. M. Kessels
Valery Avanasiev
Andre Stesmans
Marc M. Heyns
Marc Meuris
Publisher
ECS
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