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Atomic Layer Deposition of High-K Dielectric Layers on Ge and III-V MOS Channels

doi 10.1149/1.2986824
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Abstract

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Date

January 1, 2008

Authors
Annelies DelabieA. AlianFlorence BellengerGuy BrammertzDavid P. BruncoMatty CaymaxThierry ConardA. FranquetMichel HoussaSonja SionckeS. Van ElshochtJ. L. Van HemmenW. KeuningW. M. KesselsValery AvanasievAndre StesmansMarc M. HeynsMarc Meuris
Publisher

ECS

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