Preparation of Crystallized Carbon Nitride Based on Microwave Plasma CVD-Effect of Carbon Source and H2 Addition to Gas System on Film Properties-

Journal of The Surface Finishing Society of Japan
doi 10.4139/sfj.61.528
Full Text
Abstract

Available in full text

Date
Authors
Publisher

The Surface Finishing Society of Japan

Related search

Friction and Wear Properties of Carbon Nitride Synthesized Using Microwave Plasma CVD

Journal of The Surface Finishing Society of Japan
2015English

Hard Carbon Film Coating by Plasma CVD.

SHINKU
1988English

Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition

Applied Physics Letters
AstronomyPhysics
2002English

Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD

Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2005English

Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation

1989English

Effect of H2 Gas Addition on Si Oxidation Process With Ar and O2 Mixture Surface Wave Plasma

2011English

Preparation and Properties of Black Anodic Oxide Film on Aluminium by CVD Method

Journal of the Japan Society of Colour Material
1987English

Microwave Plasma Assisted Preparation of Pd-Nanoparticles With Controlled Dispersion on Woven Activated Carbon Fibres

Catalysis Today
CatalysisChemistry
2005English

Effect of Molybdenum Addition on Microstructure and Mechanical Properties of Plain Carbon Steel Weld

Metallurgical and Materials Engineering
AlloysMetalsMechanical Engineering
2016English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy