Measurement and Modeling of Neutral, Radical, and Ion Densities in H2-N2-Ar Plasmas

Journal of Applied Physics - United States
doi 10.1063/1.4913623
Full Text
Abstract

Available in full text

Date
Authors
Publisher

AIP Publishing

Related search

Characterization of Transport of Titanium Neutral Atoms Sputtered in Ar and Ar/N2 HIPIMS Discharges

Plasma Sources Science and Technology
Condensed Matter Physics
2019English

Correction To: Densities of Active Species in R/X%(N2–5%H2) (R = Ar or He) Microwave Flowing Afterglows

Plasma Chemistry and Plasma Processing
SurfacesCondensed Matter PhysicsChemical EngineeringFilmsCoatingsChemistry
2019English

Atomic Ion Crystals in Non-Neutral Plasmas

1999English

Elucidation of Electron Density and Temperature Distributions of Rf Ar-H2 Thermal Plasmas Using Spectroscopic Measurements, Modeling Works and Macroscopic Observations

Journal of Plasma and Fusion Research
2003English

Detailed Study of the Plasma-Activated Catalytic Generation of Ammonia in N2-H2 Plasmas

Journal of Applied Physics
AstronomyPhysics
2007English

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Coatings
SurfacesFilmsCoatingsMaterials ChemistryInterfaces
2017English

Plasma Expansion in H2, He, Ar, and H2-He Plasma

Plasma and Fusion Research
Condensed Matter Physics
2019English

Velocity-Changing Collisions in Pure H2 and H2-Ar Mixture

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2014English

Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas

Journal of Physical Chemistry A
MedicineTheoretical ChemistryPhysical
2016English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy