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Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films
ElectroComponent Science and Technology
doi 10.1155/apec.7.159
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Date
January 1, 1980
Authors
S. Abdin
A. Huber
G. Morillot
C. Val
Publisher
Hindawi Limited
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