Kinetics and Compositional Dependence on the Microwave Power and SiH[sub 4]/N[sub 2] Flow Ratio of Silicon Nitride Deposited by Electron Cyclotron Resonance Plasmas
Journal of the Electrochemical Society - United States
doi 10.1149/1.2059309
Full Text
Open PDFAbstract
Available in full text
Categories
Date
January 1, 1994
Authors
Publisher
The Electrochemical Society