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Study of High Temperature Reaction Between Ti and SiO2 at Interface in Ti/SiO2/TiSi2/Si System by XPS.

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doi 10.3131/jvsj.29.220
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Abstract

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Date

January 1, 1986

Authors
Wei Yi YANGShogo NAKAMURATsukasa KURODA
Publisher

The Vacuum Society of Japan


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