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Publications by A. H. Heuer
Thermal Expansion of Low-Pressure Chemical Vapor Deposition Polysilicon Films
Journal of Materials Research
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Related publications
Low Temperature Fabrication of Thermochromic VO2thin Films by Low-Pressure Chemical Vapor Deposition
RSC Advances
Chemistry
Chemical Engineering
Low-Temperature, Low-Pressure Chemical Vapor Deposition and Solid Phase Crystallization of Silicon–Germanium Films
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Low-Pressure Chemical Vapor Deposition of LiCoO[sub 2] Thin Films: A Systematic Investigation of the Deposition Parameters
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane
Magnetic Properties of Semiconducting Spinel CdCr2S4 Nanostructured Films Grown by Low-Pressure MetalOrganic Chemical Vapor Deposition
Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Chemical Vapor Deposition of Azidoalkylsilane Monolayer Films
Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
