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Publications by A. H. Mayabadi
Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
Related publications
In Situ-Doped Silicon Thin Films for Passivating Contacts by Hot-Wire Chemical Vapor Deposition With a High Deposition Rate of 42 Nm/Min
Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor
Materials Science Forum
Deposition of Microcrystalline Silicon Prepared by Hot-Wire Chemical-Vapor Deposition: The Influence of the Deposition Parameters on the Material Properties and Solar Cell Performance
Journal of Applied Physics
Astronomy
Physics
Microstructure and Deposition Rate of Aluminum Thin Films From Chemical Vapor Deposition With Dimethylethylamine Alane
Applied Physics Letters
Astronomy
Physics
Doping of Amorphous and Microcrystalline Silicon Films Deposited at Low Substrate Temperatures by Hot-Wire Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Defects in Silicon Carbide Grown by Fluorinated Chemical Vapor Deposition Chemistry
Physica B: Condensed Matter
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Electronic
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
High Speed Deposition of Y2O3 Films by Laser-Assisted Chemical Vapor Deposition
Materials Transactions
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
