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Publications by Akinobu Teramoto
Carrier Mobility in Field-Effect Transistors
Similarity Between Strain Fields Induced by the Xe/Nh3 Plasma Nitridation and the Kr/O2 Plasma Oxidation Revealed by a Multi-Wave X-Ray Diffraction Phenomenon
Transactions of the Materials Research Society of Japan
Electric Characteristics of Si3N4 Films Formed by Directly Radical Nitridation on Si (110) and Si (100) Surfaces.
Atomic Order Flattening of Hydrogen-Terminated Si(110) Substrate for Next Generation ULSI Devices
