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Publications by Andre Wachowiak

Impact of Postdeposition Annealing Upon Film Properties of Atomic Layer Deposition-Grown Al2O3 on GaN

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Electronic Engineering

Condensed Matter Physics

Instrumentation

Materials Chemistry

Magnetic Materials

Process Chemistry

English

Related publications

Ca Test of Al2O3 Gas Diffusion Barriers Grown by Atomic Layer Deposition on Polymers

Applied Physics Letters

English

Silicon Nanowire Heterojunction Solar Cells With an Al2O3 Passivation Film Fabricated by Atomic Layer Deposition

Nanoscale Research Letters

Materials Science

Condensed Matter Physics

English

Postdeposition Annealing Effect on Cu2ZnSnS4Thin Films Grown at Different Substrate Temperature

International Journal of Photoenergy

Materials Science

Renewable Energy

Molecular Physics,

the Environment

English

Effects of Seed Layer and Thermal Treatment on Atomic Layer Deposition-Grown Tin Oxide

Transactions on Electrical and Electronic Materials

Electronic Engineering

Magnetic Materials

English

Negative Charge Trapping Effects in Al2O3 Films Grown by Atomic Layer Deposition Onto Thermally Oxidized 4h-SiC

English

Dielectric and Optical Properties of Zr Silicate Thin Films Grown on Si(100) by Atomic Layer Deposition

Journal of Applied Physics

English

In Situ Reaction Mechanism Studies of Plasma-Assisted Atomic Layer Deposition of Al2O3

Applied Physics Letters

English

Competition Between Al2O3 Atomic Layer Etching and AlF3 Atomic Layer Deposition Using Sequential Exposures of Trimethylaluminum and Hydrogen Fluoride

Journal of Chemical Physics

Theoretical Chemistry

English

Study on Deposition of Al2O3 Films by Plasma-Assisted Atomic Layer With Different Plasma Sources

Plasma Science and Technology

Condensed Matter Physics

English