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Publications by Antti Rahtu
Atomic Layer Deposition of Ultrathin Copper Metal Films From a Liquid Copper(I) Amidinate Precursor
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Related publications
Nonfluorinated Volatile Copper(I) 1, 3-Diketiminates as Precursors for Cu Metal Deposition via Atomic Layer Deposition
Electrochemical Deposition of Copper(I) Oxide Films
Chemistry of Materials
Materials Chemistry
Chemistry
Chemical Engineering
Hexafluoroacetylacetonate Cu Vinylcyclohexane as a Liquid Precursor for Low-Temperature Chemical Vapor Deposition of Copper Thin Films
Electrochemical and Solid-State Letters
Selective Atomic Layer Deposition of TiO2 on Silicon/Copper-Patterned Substrates
The Journal of Undergraduate Research at the University of Illinois at Chicago
Excimer-Laser-Induced Chemical Vapor Deposition of Copper Films From Copper Trifluoroacetylacetonate
Le Journal de Physique IV
A Novel Copper Precursor for Electron Beam Induced Deposition
Beilstein Journal of Nanotechnology
Electronic Engineering
Materials Science
Nanoscience
Electrical
Nanotechnology
Astronomy
Physics
Electrochemical Deposition of a Copper Carboxylate Layer on Copper as Potential Corrosion Inhibitor
Journal of Solid State Electrochemistry
Electronic Engineering
Electrical
Condensed Matter Physics
Electrochemistry
Materials Science
Atomic Layer Deposition of Magnetic Thin Films
Acta Physica Polonica A
Astronomy
Physics
MoS2 for Enhanced Electrical Performance of Ultrathin Copper Films
