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Publications by Anushka Gangnaik

Correlation of Lithographic Performance of the Electron Beam Resists SML and ZEP With Their Chemical Structure

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Electronic Engineering

Condensed Matter Physics

Instrumentation

Materials Chemistry

Magnetic Materials

Process Chemistry

English

Related publications

Study of PAG Size Effect on Lithographic Performance of 157nm Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Use of Supramolecular Assemblies as Lithographic Resists

Angewandte Chemie

English

Comparative Study of Thermally Cured and Electron-Beam-Exposed Hydrogen Silsesquioxane Resists

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists

English

Correlation Between Electron Capture Detector Response and Chemical Structure for 1,2,3,4,5,6-Hexachlorocyclohexane

Bulletin of the Chemical Society of Japan

English

The Correlation Between the Electron-Capture Detector Response and the Chemical Structure for Polychlorinated Biphenyls

Bulletin of the Chemical Society of Japan

English

Chemical Composition of Electron‐beam Evaporated TiO2 Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Cast Structure of Electron-Beam Melted Nb Alloy Ingots (The Electron Beam Melting of the Refractory Metals (X))

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Mechanics of Materials

Materials Chemistry

Condensed Matter Physics

English