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Publications by B. Holländer
SiGeSn Growth Studies Using Reduced Pressure Chemical Vapor Deposition Towards Optoelectronic Applications
Thin Solid Films
Surfaces
Alloys
Optical
Interfaces
Metals
Materials Chemistry
Magnetic Materials
Films
Coatings
Electronic
Effect of Helium Ion Implantation and Annealing on the Relaxation Behavior of Pseudomorphic Si1−xGex Buffer Layers on Si (100) Substrates
Journal of Applied Physics
Astronomy
Physics
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Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Thermal Expansion of Low-Pressure Chemical Vapor Deposition Polysilicon Films
Journal of Materials Research
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Formation of BNBased Superhard Nano Composites Using Chemical Vapor Deposition/High Pressure Hybrid Process.
Materia Japan
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane
Low Pressure Chemical Vapor Deposition of Massive Si1-xGex Gradient Crystals and Applications in Short-Wavelength Diffraction
Surface and Coatings Technology
Surfaces
Condensed Matter Physics
Interfaces
Materials Chemistry
Films
Coatings
Chemistry
Suppression of Graphene Nucleation by Turning Off Hydrogen Supply Just Before Atmospheric Pressure Chemical Vapor Deposition Growth
Coatings
Surfaces
Films
Coatings
Materials Chemistry
Interfaces
Plasmon-Assisted Chemical Vapor Deposition