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Publications by Bum-Wook Lee
Adhesion Enhancement of Norbornene Polymers With Lithocholate Substituents for 193-Nm Resists
Polymer Journal
Polymers
Materials Chemistry
Plastics
Related publications
PAG Incorporated Polymeric Resists for Sub-100 Nm Patterning at 193 Nm Exposure
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Photodissociation of Isobutene at 193 Nm
Physical Chemistry Chemical Physics
Theoretical Chemistry
Astronomy
Physics
Physical
Laser Ablation of Nanoscale Particles With 193 Nm Light
Journal of Physics: Conference Series
Astronomy
Physics
Integration of Directed Self-Assembly With 193 Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Phase-Shift Mask Issues for 193-Nm Lithography
A Resolution Enhancement Material for 193-Nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl Alcohol) With Uniform Resist Pattern Shrinkage
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Photodissociation Dynamics of Benzyl Alcohol at 193 Nm
Journal of Chemical Physics
Medicine
Theoretical Chemistry
Astronomy
Physics
Physical
Photochemical Interaction of Polystyrene Nanospheres With 193 Nm Pulsed Laser Light
Journal of Physical Chemistry B
Surfaces
Theoretical Chemistry
Materials Chemistry
Films
Medicine
Coatings
Physical
Roughness and Light Scattering of Ion-Beam-Sputtered Fluoride Coatings for 193 Nm
Applied Optics