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Publications by C. Höpfner

Real-Time Monitoring of Chemical Vapor Deposition Processes: Effects of Pressure and Flow

Acta Crystallographica Section A Foundations of Crystallography
1996English

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Causes of Anomalous Solid Formation in the Exhaust Systems of Low-Pressure Chemical Vapor Deposition and Plasma Enhanced Chemical Vapor Deposition Semiconductor Processes

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Preparation of Si3N4 by Chemical Vapor Deposition (Effects of Raw Gas Flow Rate)

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Analysis of Vapor Deposition Processes

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Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition

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