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Publications by C. O'MEARA
The EVALUATION OF Β-Si3N4 MICROSTRUCTURES USING PLASMA-ETCHING AS a PREPARATIVE TECHNIQUE
Le Journal de Physique Colloques
Related publications
Erratum: “Two-Step Cycling Process Alternating Implantation and Remote Plasma Etching for Topographically Selective Etching: Application to Si3N4 Spacer Etching” [J. Appl. Phys. 126, 243301 (2019)]
Journal of Applied Physics
Astronomy
Physics
CO2 Laser-Induced Surface Oxidation and Etching of Si and Si3N4.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
New Etching System Using Alkylimidazolato Copper(II) Film as Etching Resist.
Circuit Technology
Feedback Control of Plasma Etching Reactors for Improved Etching Uniformity
Chemical Engineering Science
Applied Mathematics
Chemistry
Chemical Engineering
Manufacturing Engineering
Industrial
Optical Microstructures and Room-Temperature Mechanical Properties of Si3N4-MgO-Al2O3 Ceramics.
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Alloys
Industrial
Mechanical Engineering
Metals
Materials Chemistry
Manufacturing Engineering
Control of Anisotropy in Etching Process Using Electron-Beam-Excited Plasma
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Fluorocarbon Assisted Atomic Layer Etching of SiO2 Using Cyclic Ar/C4f8 Plasma
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Room Temperature Strength of Β-Sialon Fabricated Using Α-Si3N4 Powder and an Aluminumhydroxide Solution
Journal of the Ceramic Society of Japan
Plasma Chemistries for High Density Plasma Etching of SiC
Journal of Electronic Materials
Electronic Engineering
Condensed Matter Physics
Optical
Materials Chemistry
Electrical
Magnetic Materials
Electronic
