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Publications by Derwin Washington

Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for MEMS Application

2004English

Related publications

Fluorocarbon Films Deposited by Deep Reactive Ion Etching for Stiction Minimization of MEMS Structures

2005English

Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching

Advances in Materials Science and Engineering
Materials ScienceEngineering
2014English

Reactive Ion Etching of Quartz and Pyrex for Microelectronic Applications

Journal of Applied Physics
AstronomyPhysics
2002English

Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure

Metallurgical and Materials Engineering
AlloysMetalsMechanical Engineering
2014English

Reactive Ion Etching of SiGe Alloys Using HBr

Applied Physics Letters
AstronomyPhysics
1991English

Microstructure of Thick Polycrystalline Silicon Films for MEMS Application

Microscopy and Microanalysis
Instrumentation
2002English

Liberation of Ion Implanted Ge Nanocrystals From a Silicon Dioxide Matrix via Hydrofluoric Acid Vapor Etching

Materials Research Society Symposium - Proceedings
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2003English

Reactive Ion Etching Characteristics of Permalloy Thin Films

Journal of the Magnetics Society of Japan
1999English

The Black Silicon Method II:The Effect of Mask Material and Loading on the Reactive Ion Etching of Deep Silicon Trenches

Microelectronic Engineering
SurfacesElectronic EngineeringCondensed Matter PhysicsElectronicMolecular Physics,NanoscienceOpticalElectricalAtomicMagnetic MaterialsFilmsNanotechnologyOpticsCoatings
1995English

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