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Publications by F. Paritosh

Modifying the Microstructure and Morphology of Film Surface Layers by Manipulating Chemical Vapor Deposition Reactor Conditions

Journal of Applied Physics

English

Related publications

Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

English

Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition

Journal of the Electrochemical Society

Condensed Matter Physics

Electrochemistry

Materials Chemistry

Magnetic Materials

Renewable Energy

the Environment

English

Chemical Vapor Deposition of Ruthenium-Based Layers by a Single-Source Approach

Journal of Materials Chemistry C

Materials Chemistry

English

X-Rays Response of Diamond Detectors Constructed Using Diamond Layers Produced by Low Power Microwave Chemical Vapor Deposition Reactor

Acta Physica Polonica A

English

Morphology and Photoresponse of Crystalline Antimony Film Grown on Mica by Physical Vapor Deposition

Materials Science-Poland

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

Structure and Morphology of Poly(isobenzofuran) Films Grown by Hot-Filament Chemical Vapor Deposition

English

Microstructure and Deposition Rate of Aluminum Thin Films From Chemical Vapor Deposition With Dimethylethylamine Alane

Applied Physics Letters

English

Temperature Dependence of Chemical-Vapor Deposition of Pure Boron Layers From Diborane

Applied Physics Letters

English

The Carbonaceous Film Made by Chemical Vapor Deposition of 2, 5-Dimethyl-P-Benzoquinone (2)

English