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Publications by F. T. Docherty
Advanced Nanoanalysis of a Hf-Based High-K Dielectric Stack Prior to Activation
Electrochemical and Solid-State Letters
Related publications
Nanoanalysis of Advanced Materials
Microscopy and Microanalysis
Instrumentation
Nanochemistry and Structure of Zr and Hf Based High Dielectric Constant Films
Microscopy and Microanalysis
Instrumentation
Thermal Stability of Hf-Based High-Κ Dielectric Films on Si(100)
Microscopy and Microanalysis
Instrumentation
Hf-Based High-K Materials for Si Nanocrystal Floating Gate Memories
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
High-K Dielectric Sulfur-Selenium Alloys
Science advances
Multidisciplinary
Pentacene Based Thin Film Transistors With High-K Dielectric Nd2O3 as a Gate Insulator
Brazilian Journal of Physics
Astronomy
Physics
Theoretical Study on Leakage Current in MOS With High-K Dielectric Stack: Effects of In-Plane-Longitudinal Kinetic Energy Coupling and Anisotropic Masses
Transactions of the Materials Research Society of Japan
Effective Improvement of High-K Hf-Silicate∕silicon Interface With Thermal Nitridation
Electronics Letters
Electronic Engineering
Electrical
Temperature Effects of Constant Bias Stress on NFETs With Hf-Based Gate Dielectric
