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Publications by Fu-Ying Lee
The Chemical States and Atomic Structure Evolution of Ultralow-Energy High-Dose Boron Implanted Si(110) via Laser Annealing
Scientific Reports
Multidisciplinary
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Microwave Annealing of Phosphorus and Cluster Carbon Implanted (100) and (110) Si
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Atomic Transport and Chemical Stability During Annealing of UltrathinAl2O3Films on Si
Physical Review Letters
Astronomy
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Boron-Enhanced Diffusion of Boron From Ultralow-Energy Boron Implantation
Adsorption of Atomic Oxygen on the Si(110)5×1 Surface via Interaction With N2O
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Defects Annealing of Si+ Implanted GaAs at RT and 100°C
Materials Research Society Symposium - Proceedings
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Segregation of Ion Implanted Sulfur in Si(100) After Annealing and Nickel Silicidation
Journal of Applied Physics
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Implantation Activation Annealing of Si-Implanted Gallium Nitride at Temperatures > 1,100 C
Evolution of Vacancy-Related Defects Upon Annealing of Ion-Implanted Germanium
Physical Review B
Atomic Energy and Chemical Industry
Journal of the Fuel Society of Japan