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Publications by G.W. Rubloff
Role of Implantation-Induced Defects in Surface-Oriented Diffusion of Fluorine in Silicon
Materials Science Forum
Process Sensors, Simulation, and Control to Build in Reliability
Related publications
Effect of an Oxide Cap Layer and Fluorine Implantation on the Metal-Induced Lateral Crystallization of Amorphous Silicon
ECS Journal of Solid State Science and Technology
Optical
Electronic
Magnetic Materials
C.W. Laser-Induced Diffusion in Silicon.
Hydrogen-Induced Defects in FZ Silicon Crystal
Acta Crystallographica Section A Foundations of Crystallography
Ab-Initio Modeling of Point Defects, Impurities and Diffusion in Silicon
ECS Meeting Abstracts
Self-Diffusion in Silicon: Similarity Between the Properties of Native Point Defects
Physical Review Letters
Astronomy
Physics
Role of Long Jumps in Surface Diffusion
Physical Review E
Defects in Silicon
Reports on Progress in Physics
Medicine
Astronomy
Physics
Role of Silicon Oxide Defects in Emission Process of Si-SiO2 Systems
Semiconductor Physics, Quantum Electronics and Optoelectronics
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
LASER IMPLANTATION OF Fe IN SILICON
Le Journal de Physique Colloques
