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Publications by Gerard M. Schmid
Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Positive Chemically Amplified Resists Using Naphthoquinone Diazides as Photo-Acid-Generators.
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Novel Diffusion Analysis in Advanced Chemically Amplified DUV Resists Using Photometric Methods.
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Photochemistry of Imino Sulfonate Compounds and Their Application to Chemically Amplified Resists.
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Platinum and Palladium Oxalates: Positive-Tone Extreme Ultraviolet Resists
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Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists.
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