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Publications by H.J. van Weerden
Characteristics of Er-Doped Al/Sub 2/O/Sub 3/ Thin Films Deposited by Reactive Co-Sputtering
IEEE Journal of Quantum Electronics
Electronic Engineering
Condensed Matter Physics
Molecular Physics,
Electrical
Atomic
Optics
Related publications
Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
AlNxOy Thin Films Deposited by DC Reactive Magnetron Sputtering
Applied Surface Science
Surfaces
Astronomy
Condensed Matter Physics
Interfaces
Films
Coatings
Chemistry
Physics
Annealing Effects on V2o5-X Thin Films Deposited by Non Reactive Sputtering
Nanosystems: Physics, Chemistry, Mathematics
Intense Photoluminescence From Erbium-Doped Tantalum Oxide Thin Films Deposited by Sputtering
IEICE Electronics Express
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Electronic
Physical Characteristics of TiOx Thin Films Obtained by DC Reactive Sputtering
Characteristics of SiO[sub X] Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition Using PDMS∕O[sub 2]∕He
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
ELECTRON PARAMAGNETIC RESONANCE ABSORPTION STUDIES OF (Al$sub 2$O$sub 3$)/ Sub 1-X/ (Cr$sub 2$O$sub 3$)/Sub X/ WITH CONTROLLED NEUTRON TREATMENTS.
HfSiON Films Deposited by Radio Frequency Reactive Sputtering
Структурные И Магнитные Характеристики Однослойных И Многослойных Наногранулированных Пленок Co-Al-=sub=-2-=/Sub=-O-=sub=-3-=/Sub=-, Полученных Методом Твердофазного Синтеза
Журнал технической физики
