Characteristics of SiO[sub X] Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition Using PDMS∕O[sub 2]∕He

Journal of the Electrochemical Society - United States
doi 10.1149/1.3129464
Full Text
Abstract

Available in full text

Date
Authors
Publisher

The Electrochemical Society

Related search

Characteristics of Diamondlike Carbon Film Deposited by Magnetron Plasma Enhanced Chemical Vapor Deposition Using a Roll Coater.

SHINKU
2000English

Deposition of SiO[sub 2] Layers on GaN by Photochemical Vapor Deposition

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2003English

Processing of PbTiO{sub 3} and Pb(Zr{sub X}Ti{sub 1{minus}x})O{sub 3} Thin Films by Novel Single-Solid-Source Metalorganic Chemical Vapor Deposition

1997English

Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition

Sensors and Materials
Materials ScienceInstrumentation
2017English

Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
1997English

Low-Pressure Chemical Vapor Deposition of LiCoO[sub 2] Thin Films: A Systematic Investigation of the Deposition Parameters

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2009English

Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition

Transactions of the Materials Research Society of Japan
2008English

Characteristics of Er-Doped Al/Sub 2/O/Sub 3/ Thin Films Deposited by Reactive Co-Sputtering

IEEE Journal of Quantum Electronics
Electronic EngineeringCondensed Matter PhysicsMolecular Physics,ElectricalAtomicOptics
2000English

Preparation of Cubic Boron Nitride Thin Film by the Helicon Wave Plasma Enhanced Chemical Vapor Deposition

Applied Physics Letters
AstronomyPhysics
1996English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy