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Publications by Han-Ting Hsueh
Approaching Defect-Free Amorphous Silicon Nitride by Plasma-Assisted Atomic Beam Deposition for High Performance Gate Dielectric
Scientific Reports
Multidisciplinary
Related publications
Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
Journal of Applied Sciences
Dielectric Properties of Er−doped HfO2 (Er∼15%) Grown by Atomic Layer Deposition for High-Κ Gate Stacks
Applied Physics Letters
Astronomy
Physics
Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
In Situ Infrared Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Anticorrosion Behaviour of Amorphous Silicon-Based Coatings Prepared by Remote Cold Plasma-Assisted Chemical Vapour Deposition Process
New Trends and Issues Proceedings on Advances in Pure and Applied Sciences
Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Crystalline SrZrO3 Deposition on Ge (001) by Atomic Layer Deposition for High-K Dielectric Applications
Journal of Applied Physics
Astronomy
Physics
Donor Neutralization in GaAs After Plasma Silicon Nitride Deposition
Applied Physics Letters
Astronomy
Physics
