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Publications by Heng-Lu Chang
Crystalline SrZrO3 Deposition on Ge (001) by Atomic Layer Deposition for High-K Dielectric Applications
Journal of Applied Physics
Astronomy
Physics
Related publications
Atomic Layer Deposition of High-K Dielectric Layers on Ge and III-V MOS Channels
Atomic Layer Deposition of High-K Dielectric Layers on Ge and III-V MOS Channels
ECS Meeting Abstracts
Atomic Layer Deposition for Energy and Environmental Applications
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
Atomic Layer Deposition of High-K Insulators on Epitaxial Graphene: A Review
Applied Sciences (Switzerland)
Instrumentation
Materials Science
Fluid Flow
Engineering
Computer Science Applications
Process Chemistry
Transfer Processes
Technology
Structure and Dielectric Property of High-K ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and Ozone
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
Dielectric Properties of Er−doped HfO2 (Er∼15%) Grown by Atomic Layer Deposition for High-Κ Gate Stacks
Applied Physics Letters
Astronomy
Physics
Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
Materials
Materials Science
Condensed Matter Physics
Selective Metal Deposition at Graphene Line Defects by Atomic Layer Deposition
Nature Communications
Astronomy
Genetics
Molecular Biology
Biochemistry
Chemistry
Physics
Atomic Layer Deposition: Conformal Physical Vapor Deposition Assisted by Atomic Layer Deposition and Its Application for Stretchable Conductors (Adv. Mater. Interfaces 22/2018)
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
