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Publications by Hidekazu YOSHIHARA
Characteristics of Silicide Thin Films Prepared by Sputtering Using Hot Pressed Target.
SHINKU
Related publications
ZnO Thin Films Prepared by Ion Beam Sputtering Deposition.
SHINKU
Properties of Tantalum Oxide Thin Films Prepared by Reactive Sputtering.
SHINKU
Thermal Degradation Analysis of Fluorocarbon Thin Films Prepared by an r.f. Sputtering With Poly (Tetrafluoroethylene) Target
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Structure of Indium Nitride Thin Films Prepared by RF-magnetron Sputtering
Acta Crystallographica Section A Foundations of Crystallography
Thermoelectric Properties of Zn0.98Al0.02O Thin Films Prepared by RF Magnetron Sputtering
Journal of the Ceramic Society of Japan
Materials Chemistry
Chemistry
Condensed Matter Physics
Composites
Ceramics
Step Coverage of Al Films Prepared by DC Magnetron Sputtering Using the Dual-Structure Target.
SHINKU
Effect of Sputtering Power on the Properties of TaN Thin Films Prepared by the Magnetron Sputtering
DEStech Transactions on Materials Science and Engineering
ITO Thin Films Prepared by Magnetron Sputtering Method Using ITO Target. Effects of Plasma Conditions and Substrate Temperature on ITO Film Properties.
JSME International Journal Series B
Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering
