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Publications by Hideki Motomura
Investigations of the Surface Chemistry of Silicon Substrates Etched in a Rf-Biased Inductively Coupled Fluorocarbon Plasma Using Fourier-Transform Infrared Ellipsometry
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Related publications
Growth Kinetics of Silicon Dioxide on Silicon in an Inductively Coupled Rf Plasma at Constant Anodization Currents
Journal of Applied Physics
Astronomy
Physics
Micro Variable Infrared Filter Using Magnetron Sputtering System Enhanced With an Inductively Coupled RF Plasma for CO2 Measurement.
SHINKU
Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide
International Journal of Photoenergy
Materials Science
Renewable Energy
Molecular Physics,
Sustainability
Atomic
Chemistry
Optics
the Environment
Investigation of Pyrolysis Gas Chemistry in an Inductively Coupled Plasma Facility
Black Silicon With Ultra-Low Surface Recombination Velocity Fabricated by Inductively Coupled Power Plasma
Physica Status Solidi - Rapid Research Letters
Materials Science
Condensed Matter Physics
Investigations Into the Origins of Polyatomic Ions in Inductively Coupled Plasma-Mass Spectrometry
Fourier Transform Infrared and Fourier Transform Raman Spectroscopy of Polymers
Structure-Property Relations in Polymers
Surface Chemistry During Plasma Etching of Silicon
Pure and Applied Chemistry
Chemistry
Chemical Engineering
Near Surface CO2 Detection in an Inductively Coupled Plasma Facility Using Diode Laser Absorption
