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Publications by I. H. Won
Negative Resistance Phenomenon in Dual-Frequency Capacitively Coupled Plasma-Enhanced Chemical Vapor Deposition System for Photovoltaic Manufacturing Process
Journal of Applied Physics
Astronomy
Physics
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Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
Active and Passive Electronic Components
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Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Films
Interfaces
Condensed Matter Physics
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Process for Growth of Group-Iv Alloys Containing Tin by Remote Plasma Enhanced Chemical Vapor Deposition
Frontiers in Materials
Materials Science
Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
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Probing Periodic Oscillations in a Silane Dusty Plasma in a Very High-Frequency Plasma Enhanced Chemical Vapor Deposition Process1
Canadian Journal of Physics
Astronomy
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Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
In Situfluorine-Modified Organosilicate Glass Prepared by Plasma Enhanced Chemical Vapor Deposition
Journal of Applied Physics
Astronomy
Physics
A High Temperature, Plasma-Assisted Chemical Vapor Deposition System
Photoluminescence From Carbon Structures Grown by Inductively Coupled Plasma Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
