In Situfluorine-Modified Organosilicate Glass Prepared by Plasma Enhanced Chemical Vapor Deposition

Journal of Applied Physics- United States

doi 10.1063/1.1578171

Full Text

Abstract

Available in

Categories

Date

July 1, 2003

Authors

Shiuh-Ko JangJean

Weng-Sing Hwang

Publisher

AIP Publishing

Related search

Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.

English

Control of Crystallinity in Nanocrystalline Silicon Prepared by High Working Pressure Plasma-Enhanced Chemical Vapor Deposition

Advances in Materials Science and Engineering

Materials Science

English

Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)

English

Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires

Mechanics of Materials

Electronic Engineering

Mechanical Engineering

Materials Science

English

Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System

Active and Passive Electronic Components

Electronic Engineering

Magnetic Materials

English

Plasma-Etching-Enhanced Deep Centers in N-GaN Grown by Metalorganic Chemical-Vapor Deposition

Applied Physics Letters

English

Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition

Sensors and Materials

Materials Science

Instrumentation

English

Synthesis of Graphene by Magnetron-Plasma-Enhanced Chemical Vapor Deposition on Different Substrate Materials

Journal of the Vacuum Society of Japan

Instrumentation

Materials Science

English