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Publications by I. P. Herman
Surface Chemistry During Plasma Etching of Silicon
Pure and Applied Chemistry
Chemistry
Chemical Engineering
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Origin of Plasma-Induced Surface Roughening and Ripple Formation During Plasma Etching: The Crucial Role of Ion Reflection
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Remote Plasma Etching of Silicon Nitride and Silicon Dioxide Using NF3/O2 Gas Mixtures
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Ultra-Low Reflective Micro-Structures Fabricated by One-Step Advanced Silicon Etching on Silicon Surface
