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Publications by Isamu Kato
Spatial Distribution of Plasma Parameters in Microwave Plasma Chemical Vapor Deposition
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Related publications
Thermal Plasma Chemical Vapor Deposition of SiC.
ISIJ International
Mechanics of Materials
Alloys
Materials Chemistry
Metals
Mechanical Engineering
Growth of Carbon Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition at Low Temperature
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Diamond Film Grown by Microwave Plasma-Assisted Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas
Journal of Physical Chemistry A
Medicine
Theoretical Chemistry
Physical
Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
Active and Passive Electronic Components
Electronic Engineering
Optical
Electrical
Magnetic Materials
Electronic
Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Selective Growth of Carbon Nanotube on Scanning Probe Tips by Microwave Plasma Chemical Vapor Deposition
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Ultra Water-Repellent Films With Controlled Surfaces Fabricated by Microwave Plasma-Enhanced Chemical Vapor Deposition.
Journal of the Surface Finishing Society of Japan
A High Temperature, Plasma-Assisted Chemical Vapor Deposition System
