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Publications by Isreal Baumvol
Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
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In Situfluorine-Modified Organosilicate Glass Prepared by Plasma Enhanced Chemical Vapor Deposition
Journal of Applied Physics
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Electrical and Mechanical Properties of Si-B-N Films Made by Plasma-Enhanced Chemical Vapor Deposition.
Transactions of the Japan Society of Mechanical Engineers Series A
Structural and Electrical Properties of Silicon Nitride Films Prepared by Multipolar Plasma‐enhanced Deposition
Journal of Applied Physics
Astronomy
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Control of Crystallinity in Nanocrystalline Silicon Prepared by High Working Pressure Plasma-Enhanced Chemical Vapor Deposition
Advances in Materials Science and Engineering
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Process for Growth of Group-Iv Alloys Containing Tin by Remote Plasma Enhanced Chemical Vapor Deposition
Frontiers in Materials
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Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
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Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
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Uniformity and Passivation Research of Al2O3 Film on Silicon Substrate Prepared by Plasma-Enhanced Atom Layer Deposition