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Publications by J. Abrokwah
Sub-Micron, Metal Gate, High-к Dielectric, Implant-Free, Enhancement-Mode III-V Mosfets
Related publications
180 Nm Metal Gate, High-K Dielectric, Implant-Free III–V MOSFETs With Transconductance of Over 425 [Micro Sign]S∕[micro Sign]m
Electronics Letters
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Enhancement-Mode In0.53Ga0.47As N-Mosfet With Self-Aligned Gate-First Process and CVD HfAlO Gate Dielectric
Hall Mobility Measurements in Enhancement-Mode GaAs Field-Effect Transistors With Al2O3 Gate Dielectric
Applied Physics Letters
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Low Power Current-Mode Threshold Logic Gate Using Nano-Technology Double-Gate MOSFETs
The International Conference on Electrical Engineering
Sub-40 Nm SOI V-Groove N-MOSFETs
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Molybdenum Gate Electrode Technology for Deep Sub-Micron CMOS Generations
Materials Research Society Symposium - Proceedings
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A High-Frequency Transconductance Method for Characterization of High- $\Kappa$ Border Traps in III-V MOSFETs
IEEE Transactions on Electron Devices
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Low-Frequency Noise in III-V Nanowire TFETs and MOSFETs
IEEE Electron Device Letters
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High Spectral Field Enhancement and Tunability in Core–double Shell Metal–dielectric–metal Spherical Nanoparticles
RSC Advances
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