Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Joshua N. Musher
Atmospheric Pressure Chemical Vapor Deposition of TiN From Tetrakis(dimethylamido)titanium and Ammonia
Journal of Materials Research
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Related publications
The Influence of Ammonia on Rapid‐thermal Low‐pressure Metalorganic Chemical Vapor Deposited TiNxfilms From Tetrakis (Dimethylamido) Titanium Precursor Onto InP
Journal of Applied Physics
Astronomy
Physics
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Chemical Vapor Deposition of Tin Sulfide From Diorganotin(IV) Dixanthates
Journal of Materials Science
Mechanics of Materials
Materials Science
Mechanical Engineering
Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane
Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
Sensors and Materials
Materials Science
Instrumentation
Heavy Arsenic Doping of Silicon Grown by Atmospheric Pressure Selective Epitaxial Chemical Vapor Deposition
Science and Technology of Advanced Materials
Materials Science
Intrinsic P-Type ZnO Films Fabricated by Atmospheric Pressure Metal Organic Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Real-Time Optical Monitoring of Ammonia Flow and Decomposition Kinetics Under High-Pressure Chemical Vapor Deposition Conditions
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
