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Publications by K. Takiyama
Spectroscopic Study of Debris Mitigation With Minimum-Mass Sn Laser Plasma for Extreme Ultraviolet Lithography
Applied Physics Letters
Astronomy
Physics
Efficient Electron Heating in Nitrogen Clusters Irradiated With Intense Femtosecond Laser Pulses
Physical Review A
Related publications
Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography
Optics Letters
Optics
Atomic
Molecular Physics,
Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography
Physics of Plasmas
Condensed Matter Physics
Interferometric Lithography With an Amplitude Division Interferometer and a Desktop Extreme Ultraviolet Laser
Journal of the Optical Society of America B: Optical Physics
Nonlinear Physics
Optics
Atomic
Statistical
Molecular Physics,
Guest Editorial: Extreme Ultraviolet Interference Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Characteristics of Extreme Ultraviolet Emission From CO2 Laser-Produced Plasma
IEEJ Transactions on Electronics, Information and Systems
Electronic Engineering
Electrical
Characterization of a Liquid-Xenon-Jet Laser-Plasma Extreme-Ultraviolet Source
Review of Scientific Instruments
Medicine
Instrumentation
Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography
Applied Physics Letters
Astronomy
Physics
Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography
