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Publications by Katsumi Neishi
Quantitative Pattern Collapse Metrology for 193nm Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
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Optical Materials for Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Advancing Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Extension of 193nm Lithography by Chemical Shrink Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Responding to the Challenge: Materials Design for Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Immersion Lithography: Topcoat and Resist Processes
SPIE Newsroom
High Refractive Index Fluid for Next Generation ArF Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-E-Beam Maskless Lithography, or Nanoimprint?
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
New Prospect of Successors to ArF Water-Immersion Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Receding Contact Lines: From Sliding Drops to Immersion Lithography
European Physical Journal: Special Topics
Materials Science
Theoretical Chemistry
Physics
Astronomy
Physical
