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Publications by Kenichi Mizusawa
A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography
New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A New Monocyclic Fluoropolymer for 157-Nm Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A Study of Antireflective and Antistatic Coating With Ultra-Fine Particles.
Journal of the Society of Powder Technology, Japan
Filtration
Fluid Flow
Process Chemistry
Separation
Transfer Processes
Catalysis
Technology
Investigation of Antireflective Porous Silicon Coating for Solar Cells
ISRN Nanotechnology
Bottom Anti-Reflective Coatings for DUV Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Fluorinated Chemically Amplified Dissolution Inhibitors for 157 Nm Nanolithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Phase-Shift Mask Issues for 193-Nm Lithography
Broadband Antireflective Coating by the Method of Molecular Layer Deposition
Izvestiâ vysših učebnyh zavedenij. Priborostroenie
