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Publications by Keun Do Ban

The Need of Top Anti-Reflective Coating Materials for ArF Immersion Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

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Optical Materials for Immersion Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

High Refractive Index Fluid for Next Generation ArF Immersion Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

New Prospect of Successors to ArF Water-Immersion Lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Electronic Engineering

Condensed Matter Physics

Mechanical Engineering

Molecular Physics,

Magnetic Materials

English

Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-E-Beam Maskless Lithography, or Nanoimprint?

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Electronic Engineering

Condensed Matter Physics

Mechanical Engineering

Molecular Physics,

Magnetic Materials

English

Bottom Anti-Reflective Coatings for DUV Lithography.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Responding to the Challenge: Materials Design for Immersion Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Synthesis of MgF2 Nanoparticles for Improved Anti-Reflective Coating

Journal of Korean Institute of Metals and Materials

Magnetic Materials

English

Materials and Process Parameters on ArF Immersion Defectivity Study

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Advancing Immersion Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English