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Publications by Kosai Fukunari

Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2019English

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Towards 11nm Half-Pitch Resolution for a Negative-Tone Chemically Amplified Molecular Resist Platform for Extreme-Ultraviolet Lithography

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The Effects of Polymer Undercoats on the Pattern Profile of Chemically Amplified Resists.

Journal of Photopolymer Science and Technology
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1993English

Determination of Optimum Thermalization Distance Based on Trade-Off Relationship Between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists

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Chemically Amplified Resists. III. The Final Phenolic Product Formation Mechanism From T-Boc.

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Study on Resist Performance of Chemically Amplified Molecular Resists Based on Cyclic Oligomers

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Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Guest Editorial: Extreme Ultraviolet Interference Lithography

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Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

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Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-Situ FT-IR Spectroscopy.

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