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Publications by Kwang-Duk Ahn

New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2001English

Related publications

A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2003English

O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography

Polymer Journal
PolymersMaterials ChemistryPlastics
1989English

Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography

2003English

Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1997English

The Need of Top Anti-Reflective Coating Materials for ArF Immersion Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2005English

Investigation of Antireflective Porous Silicon Coating for Solar Cells

ISRN Nanotechnology
2011English

Pulse Laser Treatment of a Composite Material Surface in the Processes of Broadband Antireflective Coating Formation

Doklady of the National Academy of Sciences of Belarus
2020English

One Meter KrF Laser System

1977English

Coating Materials Containing Metal Nanoparticles Protected by Polymer

Kobunshi
Materials SciencePolymersPlasticsChemical EngineeringEnvironmental Science
2004English

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