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Publications by L. Henn-Lecordier

Real-Time, in Situ Film Thickness Metrology in a 10 Torr W Chemical Vapor Deposition Process Using an Acoustic Sensor

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

Related publications

Real-Time Process and Product Diagnostics in Rapid Thermal Chemical Vapor Deposition Using in Situ Mass Spectrometric Sampling

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

Real-Time In-Situ Investigation of III-V Nanowire Growth Using Custom-Designed Hybrid Chemical Vapor Deposition-Tem

Microscopy and Microanalysis

Instrumentation

English

Process Control in Metalorganic Chemical Vapor Deposition of CdTe

Materials Transactions, JIM

English

Carbon Dioxide Adsorption Using Activated Carbon via Chemical Vapor Deposition Process

Engineering Journal

English

Real-Time Monitoring of Chemical Vapor Deposition Processes: Effects of Pressure and Flow

Acta Crystallographica Section A Foundations of Crystallography

English

A New Tungsten Gate Metal Oxide Semiconductor Capacitor Using a Chemical Vapor Deposition Process

Journal of the Electrochemical Society

Condensed Matter Physics

Electrochemistry

Materials Chemistry

Magnetic Materials

Renewable Energy

the Environment

English

Momentum and Thermal Boundary-Layer Thickness in a Stagnation Flow Chemical Vapor Deposition Reactor

Journal of Materials Research

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

In Situ Optical Diagnostics of Silicon Chemical Vapor Deposition Gas-Phase Processes

AIP Conference Proceedings

English

In Situ Real Time Process Characterization in Nanoimprint Lithography Using Time-Resolved Diffractive Scatterometry

Applied Physics Letters

English