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Publications by Liew Chan Ming

A Surface-Silylated Single-Layer Resist Using Chemical Amplification: A New Simpler Alternative for Multilayer Resist System.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

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Photoresists for Microlithography Chemical Amplification in Resist Design

Journal of the Japan Society of Colour Material

English

A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

New Etching System Using Alkylimidazolato Copper(II) Film as Etching Resist.

Circuit Technology

English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Spreading of Liquid Drop on Resist Film Surface

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Temporary Bonding With Polydimethylglutarimide Based Lift Off Resist as a Layer Transfer Platform

ECS Journal of Solid State Science and Technology

Magnetic Materials

English

Novolak Resist Removal Using Laser (266/532nm)

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Amyloid Cannot Resist Identification

Molecular Neuroscience

Infectious Diseases

English

Vertically Tapered Layers for Optical Applications Fabricated Using Resist Reflow

Journal of Micromechanics and Microengineering

Mechanics of Materials

Electronic Engineering

Mechanical Engineering

Magnetic Materials

English