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Publications by M. C. M. van de Sanden

Reaction Mechanisms During Plasma-Assisted Atomic Layer Deposition of Metal Oxides: A Case Study for Al2O3

Journal of Applied Physics
AstronomyPhysics
2008English

Density and Production of NH and NH2 in an Ar–NH3 Expanding Plasma Jet

Journal of Applied Physics
AstronomyPhysics
2005English

Formation of Cationic Silicon Clusters in a Remote Silane Plasma and Their Contribution to Hydrogenated Amorphous Silicon Film Growth

Journal of Applied Physics
AstronomyPhysics
1999English

Determining the Material Structure of Microcrystalline Silicon From Raman Spectra

Journal of Applied Physics
AstronomyPhysics
2003English

N, NH, and NH2 Radical Densities in a Remote Ar–NH3–SiH4 Plasma and Their Role in Silicon Nitride Deposition

Journal of Applied Physics
AstronomyPhysics
2006English

The Effect of Ion-Surface and Ion-Bulk Interactions During Hydrogenated Amorphous Silicon Deposition

Journal of Applied Physics
AstronomyPhysics
2007English

In Situ Single Wavelength Ellipsometry Studies of High Rate Hydrogenated Amorphous Silicon Growth Using a Remote Expanding Thermal Plasma

Journal of Applied Physics
AstronomyPhysics
2000English

Time-Resolved Cavity Ringdown Study of the Si and SiH3 Surface Reaction Probability During Plasma Deposition of A-Si:H at Different Substrate Temperatures

Journal of Applied Physics
AstronomyPhysics
2004English

In Situprobing of Surface Hydrides on Hydrogenated Amorphous Silicon Using Attenuated Total Reflection Infrared Spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2002English

Rotational and Gas Temperatures in a Surface Conversion Negative Ion Source

AIP Conference Proceedings
AstronomyPhysics
1992English

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