Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by M. C. Polo
Plasma-Enhanced Chemical Vapor Deposition of Boron Nitride Thin Films From B2H6–H2–NH3 and B2H6–N2 Gas Mixtures
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Related publications
Preparation of Cubic Boron Nitride Thin Film by the Helicon Wave Plasma Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Preparation of Boron Nitride Thin Films by Using Plasma Chemical Transport of Boron.
Journal of the Surface Finishing Society of Japan
Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas
Journal of Physical Chemistry A
Medicine
Theoretical Chemistry
Physical
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
