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Publications by Marek Tłaczała
Investigation of Optical Properties of Silicon Oxynitride Films Deposited by RF PECVD Method
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Related publications
Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure
Metallurgical and Materials Engineering
Alloys
Metals
Mechanical Engineering
Highly Conductive P-Type Nanocrystalline Silicon Films Deposited by RF-PECVD Using Silane and Trimethylboron Mixtures at High Pressure
Vacuum
Surfaces
Instrumentation
Coatings
Condensed Matter Physics
Films
Effect of Hydrogen Content and Bonding Environment on Mechanical Properties of Hydrogenated Silicon Films Deposited by High-Frequency PECVD Process
ISRN Nanomaterials
Study on the Properties of DLC Films With Si Doping Prepared by Rf-Pecvd
Laser and Optoelectronics Progress
Optics
Electronic Engineering
Electrical
Atomic
Molecular Physics,
Effects of Pore on Dielectric Constants of Films Deposited by PECVD
PROPERTIES OF PURE SILICON AMORPHOUS FILMS PREPARED BY Rf-Bias SPUTTERING
Le Journal de Physique Colloques
Investigation of the Structural, Optical and Electrical Properties of Nd-Doped ZnO Thin Films Deposited by Spray Pyrolysis
EPJ Applied Physics
Instrumentation
Optical
Electronic
Condensed Matter Physics
Magnetic Materials
Effect of Annealing Temperature on Optical and Electrical Properties of Metallophthalocyanine Thin Films Deposited on Silicon Substrate
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Crystallization and Optical Properties of ZnO-MOx Films (M=Al, Ti, Zr) Deposited by Sol-Gel Method
Transactions of the Materials Research Society of Japan
