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Publications by Maritza G. J. Veprek-Heijman
Role of Oxygen Impurities in Etching of Silicon by Atomic Hydrogen
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Related publications
High Aspect Ratio Etching of Atomic Force Microscope-Patterned Nitrided Silicon
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Chemical Etching of Silicon
Microscopy Today
A Novel Source of Atomic Hydrogen for Passivation of Defects in Silicon
Physica Status Solidi - Rapid Research Letters
Materials Science
Condensed Matter Physics
Thermodynamics of Impurities in Pure Iron Obtained by Hydrogen Reduction
Tetsu-To-Hagane/Journal of the Iron and Steel Institute of Japan
Alloys
Condensed Matter Physics
Metals
Theoretical Chemistry
Materials Chemistry
Physical
Porous Silicon Produced by Metal-Assisted Etching
Journal of The Surface Finishing Society of Japan
Carrier Trapping by Oxygen Impurities in Molybdenum Diselenide
3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching
Advanced Functional Materials
Materials Science
Condensed Matter Physics
Electrochemistry
Nanoscience
Optical
Biomaterials
Magnetic Materials
Nanotechnology
Chemistry
Electronic
Etching Figures of Silicon Crystal
The Journal of the Japanese Association of Mineralogists, Petrologists and Economic Geologists
Competition Between Al2O3 Atomic Layer Etching and AlF3 Atomic Layer Deposition Using Sequential Exposures of Trimethylaluminum and Hydrogen Fluoride
Journal of Chemical Physics
Medicine
Theoretical Chemistry
Astronomy
Physics
Physical